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Process temperature measurement device manufacturing technology and its calibration and data interpolation method

机译:工艺温度测量装置制造技术及其校准和数据插值方法

摘要

A process condition measurement wafer assembly is disclosed. In embodiments, the process condition measurement wafer assembly includes a lower substrate and an upper substrate. In another embodiment, a process condition measurement wafer assembly includes one or more electronic components disposed on one or more printed circuit elements and interposed between an upper substrate and a lower substrate. In another embodiment, the process condition measurement wafer assembly includes one or more shielding layers formed between the lower substrate and the upper substrate. In embodiments, the one or more shielding layers are configured to electromagnetically shield the one or more electronic components and spread the voltage potential across the lower and upper substrates.
机译:公开了一种过程条件测量晶片组件。在实施例中,处理条件测量晶片组件包括下基板和上基板。在另一个实施例中,处理条件测量晶片组件包括一个或多个设置在一个或多个印刷电路元件上的电子部件,并插入在上基板和下基板之间。在另一个实施例中,处理条件测量晶片组件包括形成在下基板和上基板之间的一个或多个屏蔽层。在实施例中,一个或多个屏蔽层被配置为电磁地屏蔽一个或多个电子元件并扩展到下基板上的电压电位。

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