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Analysts, analysis methods, interference measurement systems, and programs

机译:分析师,分析方法,干扰测量系统和程序

摘要

PROBLEM TO BE SOLVED: To provide a wavelength scanning interferometer capable of measuring unevenness of a measurement object with high accuracy even if the wavelength range of a light source is expanded to the extent that the light intensity level of interference light fluctuates. SOLUTION: An acquisition unit that acquires a plurality of interference images based on light of a plurality of different wavelengths from an interference measuring device, and a non-interference component included in an interference signal for each pixel in the plurality of interference images are removed to remove the interference component. The phase gradient of the wavelength of the light irradiating the reference surface and the surface of the object to be measured is specified based on the output removal unit, the conversion unit that generates an analysis signal by Hilbert conversion of the interference component, and the interference component and the analysis signal. Therefore, an analysis device including a calculation unit for calculating the distance between the reference surface and the surface of the object to be measured is provided. [Selection diagram] Fig. 2
机译:要解决的问题:提供一种波长扫描干涉仪,其能够以高精度测量测量对象的不均匀性,即使光源的波长范围扩展到干涉光的光强度水平波动的程度。解决方案:采集单元基于来自干扰测量装置的多个不同波长的光获取多个干扰图像,以及包括在多个干涉图像中的每个像素的干扰信号中的非干扰分量被移除到删除干扰组件。基于输出去除单元,指定照射参考表面的光波长的相位梯度和待测量的物体的表面,通过干扰分量的HILBERT转换产生分析信号的转换单元,以及干扰组件和分析信号。因此,提供了一种用于计算用于计算待测量物体的参考表面和表面之间的距离的计算单元的分析装置。 [选择图]图2

著录项

  • 公开/公告号JP2021060312A

    专利类型

  • 公开/公告日2021-04-15

    原文格式PDF

  • 申请/专利权人 株式会社ミツトヨ;

    申请/专利号JP20190185330

  • 发明设计人 松浦 心平;

    申请日2019-10-08

  • 分类号G01B11/24;G01B9/02;G01B11/30;

  • 国家 JP

  • 入库时间 2022-08-24 18:15:24

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