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Compound semiconductor equipment, manufacturing methods for compound semiconductor equipment, power supply equipment, and amplifiers

机译:复合半导体设备,化合物半导体设备,供电设备和放大器的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a compound semiconductor device using a nitride semiconductor material capable of preventing occurrence of current collapse phenomenon.SOLUTION: The compound semiconductor device includes: a substrate 21; an electron travel layer 23 formed over the substrate 21; a compound semiconductor layer 26 containing Ga formed above the electron travel layer 23; a diffusion prevention layer 41 containing gallium oxide formed over the compound semiconductor layer 26; an insulator layer 42 formed over the diffusion prevention layer 41; and a source electrode 40a, a drain electrode 40b, and a gate electrode 49a, which are formed above the electron travel layer 23 being separated from each other.SELECTED DRAWING: Figure 10
机译:要解决的问题:提供一种使用能够防止电流塌陷现象的发生的氮化物半导体材料的化合物半导体器件。化合物半导体器件包括:基板21;在基板21上形成的电子行进层23;包含在电子行进层23上方的Ga的化合物半导体层26;含有在化合物半导体层26上形成的氧化镓的扩散预防层41;在漫射防止层41上形成的绝缘层42;和源电极40a,漏电极40b和栅电极49a形成在电子行进层23上方,彼此分开。如图10所示

著录项

  • 公开/公告号JP6859646B2

    专利类型

  • 公开/公告日2021-04-14

    原文格式PDF

  • 申请/专利权人 富士通株式会社;

    申请/专利号JP20160191599

  • 发明设计人 牧山 剛三;

    申请日2016-09-29

  • 分类号H01L21/338;H01L29/778;H01L29/812;H01L21/336;H01L29/78;

  • 国家 JP

  • 入库时间 2022-08-24 18:11:52

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