A ligand for a quantum dot, a coordinated quantum dot, a quantum dot layer and a patterning method therefor. The cleavage ligand comprises a first coordination unit A, a cleavage unit B, and an adhesion regulating unit C. The cleavage ligand is connected to the surface of a coordinated quantum dot. The patterning method for a quantum dot layer comprises: providing a substrate; coating a mixture containing the coordinated quantum dot on the substrate to form a quantum dot film; exposing the quantum dot film in a preset area with ultraviolet light, so that a photolysis reaction occurs on the cleavage unit B in the cleavage ligand, and a molecular chain segment containing the adhesion regulation unit C after the decomposition falls off from the surface of the quantum dot; and removing the quantum dot film which has not been subjected to exposure processing by washing with an organic solvent, and performing drying to form a patterned quantum dot layer. The formed quantum dot layer has a higher resolution.
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