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DUAL-PATTERN OPTICAL 3D DIMENSIONING

机译:双图案光学3D尺寸

摘要

An optical dimensioning system includes one or more light emitting assemblies configured to project one or more predetermined patterns on an object; an imaging assembly configured to sense light scattered and/or reflected off the object, and to capture an image of the object while the patterns are projected; and a processing assembly configured to analyze the image of the object to determine one or more dimension parameters of the object. The light emitting assembly may include a single piece optical component configured for producing a first pattern and second pattern. The patterns may be distinguishable based on directional filtering, feature detection, feature shift detection, or the like. A method for optical dimensioning includes illuminating an object with at least two detectable patterns; and calculating dimensions of the object by analyzing pattern separate of the elements comprising the projected patterns. One or more pattern generators may produce the patterns.
机译:光学尺寸系统包括一个或多个发光组件,其被配置为在物体上投射一个或多个预定图案;一种成像组件,被配置为感测散射和/或反射从对象的光,并在投影图案时捕获物体的图像;和一个处理组件,被配置为分析对象的图像以确定对象的一个​​或多个维度参数。发光组件可包括配置用于产生第一图案和第二图案的单件光学部件。可以基于定向滤波,特征检测,特征换档检测等来区分模式。用于光学尺寸的方法包括用至少两个可检测的图案照射物体;通过分析包括投影模式的元素的图案来计算对象的尺寸。一个或多个模式发生器可以产生模式。

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