A method of determining the focus position of a lithography mask and a measurement system for performing such a method.

摘要

To provide a method for determining a focus position of a lithography mask, and additionally a metrology system for implementing such a method.SOLUTION: For determining a focus position of a lithography mask 5, a focus stack of a measurement region free of structures to be imaged is recorded and speckle patterns of the recorded images are evaluated.SELECTED DRAWING: Figure 2