Method of manufacturing NiO upon Ni deposition substrate

摘要

The present invention relates to a method of manufacturing a substrate in which a NiO layer is formed on a Ni layer, and more particularly, to a method of manufacturing a substrate in which a part of the Ni layer is oxidized to a NiO layer by depositing a Ni layer on a Si substrate and irradiating microwaves. will be. Sputtered on the substrate to a certain thickness ( ) Depositing a layer of Ni; And by irradiating microwaves on the Ni layer, some of the Ni layer is at a certain depth ( Oxidizing to a NiO layer having ); It is preferable to include.