首页> 外国专利> A method for manufacturing a vapor deposition mask and a method for manufacturing a metal plate used for manufacturing a vapor deposition mask.

A method for manufacturing a vapor deposition mask and a method for manufacturing a metal plate used for manufacturing a vapor deposition mask.

机译:一种制造气相沉积掩模的方法及其制造用于制造气相沉积掩模的金属板的方法。

摘要

PROBLEM TO BE SOLVED: To manufacture a thin-film deposition mask having a small variation in the shape of a through hole. SOLUTION: A method for manufacturing a vapor deposition mask is made of an iron alloy containing nickel, and a first surface located on the substrate side to which a vapor deposition material that has passed through a through hole adheres and a second surface located on the opposite side of the first surface. A preparatory step for preparing a metal plate including a surface, a surface layer removing step for removing at least the surface layer on the first surface side of the metal plate, and a processing step for etching the metal plate to form a through hole in the metal plate. And. [Selection diagram] FIG. 16
机译:要解决的问题:制造薄膜沉积掩模,其具有孔的形状的小变化。溶液:制造气相沉积掩模的方法由含镍的铁合金制成,以及位于基板侧上的第一表面,其已经通过通孔粘附的气相沉积材料和位于相对的第二表面上第一表面的一侧。用于制备包括表面的金属板的准备步骤,表面层去除用于除去金属板的第一表面侧的表面层的表面层,以及用于蚀刻金属板以形成通孔的处理步骤金属板。和。 [选择图]图。 16.

著录项

  • 公开/公告号JP2021042476A

    专利类型

  • 公开/公告日2021-03-18

    原文格式PDF

  • 申请/专利权人 大日本印刷株式会社;

    申请/专利号JP20200187498

  • 发明设计人 池永 知加雄;内田 泰弘;

    申请日2020-11-10

  • 分类号C23C14/04;H05B33/10;H01L51/50;C23F1;

  • 国家 JP

  • 入库时间 2022-08-24 17:48:21

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