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A procedure and installation of refrigerant depuration of a gas (Machine-translation by Google Translate, not legally binding)
A procedure and installation of refrigerant depuration of a gas (Machine-translation by Google Translate, not legally binding)
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机译:气体制冷剂净化的程序和安装(由Google翻译进行机器翻译,不具有法律约束力)
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摘要
Improvements introduced in the object of the main patent no. 223367, by: "Process and installation of refrigerated purification of a gas", comprising a process of refrigerated purification of a gas intended to be treated at low temperature, for example in an installation of separation of the gases by liquefaction and rectification, of the type of periodic inversion of the gaseous streams in which the gas to be treated enters under pressure in a temperature-changing compartment where it is cooled and deposits its impurities, while at least part of the The treated gas, the scavenging gas, passes under a lower pressure to another exchanger compartment where the impurities deposited in the course of a previous period are reheated and vaporized, this method consisting in passing the gas to be treated successively to the two compartments of a first changer, against the current of itself and cooling it between its two steps by a former contribution cold, in passing it to one of the compartments of a second exchanger identical to the first, countercurrent to the sweeping gas, such being the contribution of cold, and the characteristics of the exchangers that the temperature of the gas to be treated, the outlet of the cold end of the first exchanger, is lower than that of the sweeping gas at the entrance of the cold end of the second exchanger, the gas to be treated being reheated, at its exit from the first exchanger and before its entry into the second, by change of heat with a bath of liquid in equilibrium with a vapor, under a constant pressure, so that the separation at the end of the first changer is canceled out and thus a sweep temperature is obtained at the hot end of the second exchanger. less equal to the deposition temperature of the impurities, characterized in that the gas to be treated, after having crossed the two compartments of the first exchanger and before entering into exchange or heat with the liquid bath, it passes to one of the adsorbent masses of a periodic permutation adsorption apparatus, in such a way that the residual impurities are retained by adsorption at a temperature close to its inlet temperature in the first exchanger. (Machine-translation by Google Translate, not legally binding)
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