PREPARATION OF THIN CERMET FILMS BY RADIO FREQUENCY SPUTTERING

• 1. 一种射频溅射制备(111)织构化钛酸锶钡介电陶瓷薄膜的方法 [P] . 中国专利： CN101230450B . 2010.10.06
• 2. 一种射频溅射制备织构化钛酸锶钡介电陶瓷薄膜的方法 [P] . 中国专利： CN101230450A . 2008-07-30
• 3. Method for preparing covellite thin film by radio frequency magnetron sputtering method and thin film solar cell using thereof [P] . KR20210097854A . 2021-08-10

  机译： 用射频磁控溅射法和薄膜太阳能电池用射频薄膜制备木质薄膜的方法

• 4. METHOD FOR FABRICATING LITHIUM COBALT OXIDE THIN FILM CATHODE USED FOR THIN FILM LITHIUM BATTERY USING RADIO-FREQUENCY SPUTTERING [P] . 韩国专利： KR100656992B1 . 2006-12-13

  机译： 射频溅射法制备用于薄膜锂电池的钴酸锂薄膜阴极的方法

• 5. METHOD FOR FABRICATING LITHIUM COBALT OXIDE THIN FILM CATHODE USED FOR THIN FILM LITHIUM BATTERY USING RADIO-FREQUENCY SPUTTERING [P] . 韩国专利： KR20060092462A . 2006-08-23

  机译： 射频溅射法制备用于薄膜锂电池的钴酸锂薄膜阴极的方法

• 1. Preparation of High Quality Indium Tin Oxide Film on a Microbial Cellulose Membrane Using Radio Frequency Magnetron Sputtering [J] . 杨加志, 赵成刚, 刘晓丽, 中国化学工程学报：英文版 . 2011,第002期
• 2. Electrical and Structural Properties of Radio Frequency （RF） Sputtered ZnO Thin Film at Low Substrate Temperature [J] . Sanusi Abdullahi, Musa Momoh, Kasim Uthman Isah 电气工程：英文版 . 2014,第001期
• 3. Preparation of tungsten disulfide thin films by radio-frequency magnetron sputtering on stainless steel and its tribological properties [C] . TAN Zhen, DU Guang-yu, LIU Kun, Vacuum and surface engineering. . 2011
• 4. Radio-Frequency Sputtered Modified Lead Titanate Thin Films for Uncooled Detectors [D] . Patel, Jessica B. 2021
• 5. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020
• 6. On the Trimming of Resistance for Cermet Thin Films by Radio Frequency Sputter-Etching Method [O] . 田沢 達夫, 梅沢 利二, Tatsuo TAZAWA, 1978

• 1. Preparation of Indium Tin Oxide Films on Polycarbonate substrates by Radio-frequency Magnetron Sputtering [J] . 刘静 . 武汉理工大学学报：材料科学英文版 . 2005,第4期
• 2. Effects of Si-Layer-Thickness Ratio on UV-Light-Emission Intensity from Si/SiOSUB2/SUBMultilayered Thin Films Prepared Using Radio-Frequency Sputtering [J] . Kenta Miura ,Hitomi Hoshino ,Masashi Honmi . 材料科学与应用期刊（英文） . 2015,第3期
• 3. Fabrication of Erbium and Ytterbium Co-Doped Tantalum-Oxide Thin Films Using Radio-Frequency Co-Sputtering [J] . Kenta Miura ,Yuki Arai ,Kazusa Kano . 材料科学与应用期刊（英文） . 2015,第5期
• 4. 稀土金属Gd薄靶的滚钆制备技术 [C] . 孙桂芝 . 第六届全国核靶技术交流会 . 1998
• 5. 射频溅射法制备透明导电陶瓷薄膜 [A] . 王璟和 . 2007