首页> 外国专利> PROCESS FOR THE REMOVAL OF SULPHUR COMPOUNDS FROM GASES OR GAS MIXTURES

PROCESS FOR THE REMOVAL OF SULPHUR COMPOUNDS FROM GASES OR GAS MIXTURES

机译:从气体或混合气中去除硫化合物的过程

摘要

1367941 Removing sulphur compounds from gases SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ NV 18 Oct 1971 [19 Oct 1970] 48251/71 Heading C1A [Also in Division B1] In removing sulphur compounds from gaseous mixtures containing them by passing the mixture under oxidizing conditions into contact with a metal and/or metal compound containing acceptor for sulphur oxides at a temperature from 325-475‹ C., and subsequently regenerating the loaded acceptor by a reduction step in the same temp. range, the gas mixture is free from solid matter, one or more fixed beds of acceptor are used, and one bed, or part of a bed is used for absorption. A second bed or part of a bed is contacted with a reducing gas, and a third bed or part of a bed is contacted with an oxidizing gas, and the gas stream being treated is transferred from passing to the bed or part thereof which has become loaded with sulphur oxides to that bed or part of a bed which has been oxidized, the released loaded bed being now subjected to the reduction step, and the released reduced bed or part of a bed being now subjected to an oxidizing step. If desired, before being oxidized the reduced bed may be contacted with an inert gas. Similarly a treatment with an inert gas may be inserted between the loading and reducing phases. The inert gas which is inert to the absorbent material under the conditions used, may be N2, CO2 or steam. The reducing gas and the oxidizing gas may be passed through the bed or part thereof in a direction counter to the direction in which the gases being treated have been passed. Preferably at least three acceptor beds are utilized, but most preferably four beds are used arranged in two parallel pairs, and the time taken for the absorption step is substantially equal to the time taken by the reducing phase, the oxidizing phase and the inert gas treatment. In a preferred embodiment shown in Figs. 1A and 2 the acceptor is in the form of a single cylindrical bed divided into non-communicating sectors by partitions 2a, 2b, 2c. The gas inlet line 5 is connected to the chamber by conical extension 6 and rotatable disc 7 provided with a single opening so that any of the three compartments may be placed on line with the gas inlet. The outlet of the apparatus is similarly equipped, the two discs being synchronized. The hole in discs 7 and 8 may be a slot 20 extending over 120 degrees of arc or simply a circular hole (Fig. 1B, not shown). Oxidizing, reducing and optionally inert gas are supplied via lines 13, 14 and 15 in desired sequence and exit through a similar array of outlets. The inlet and outlet functions of the various gas lines may be interchanged. In a second embodiment as shown in Figs. 3, 4, and 6, a cylindrical housing 29 has a central space 37 having a wall 31, and the annulus between housing and wall is divided by impermeable walls 86 into radial compartments 85. Extending down from the upper surface 31 of the housing walls 48, 49, 50 divide the upper area into a series of annular zones, and disc 41 rotates in gas tight relationship beneath the walls on radial trusses 60 and annular trusses 57, 58a, 58b, 58c which are positioned to correspond with said annular zones-viz. 44, 45, 46, and 47. These zones are fitted with inlets/outlets 52, 53, 54, 56 to admit/ exhaust gas to/from the bed and annular slots 42, 43, 81, 84, in disc 41 are positioned so as to direct gas to or from the appropriate zone, being of length to control the time taken for such action when the disc is continuously rotated during use. The base of the vessel is similarly equipped with synchronously rotating disc 38.
机译:1367941从气体中除去硫化合物1971年10月18日,MAATSCHAPPIJ NV壳国际研究中心1970年10月19日C1A标题[也属于B1分区]通过使混合物在氧化条件下与氧化氢接触而从含气混合物中除去硫化合物。在325-475℃的温度下,含有金属和/或含金属化合物的硫氧化物的受主,随后在相同温度下通过还原步骤使负载的受主再生。在此范围内,气体混合物不含固体物质,使用一个或多个受体固定床,并且使用一个床或床的一部分进行吸收。第二床或床的一部分与还原性气体接触,第三床或床的一部分与氧化性气体接触,被处理的气流从通过转移到已变成将负载有硫氧化物的氧化的床或床的一部分氧化,现在将释放的负载床进行还原步骤,将释放的还原床或床的一部分进行氧化步骤。如果需要的话,可以在还原前将还原床与惰性气体接触。类似地,可以在加载阶段和还原阶段之间插入惰性气体的处理。在所用条件下对吸收材料呈惰性的惰性气体可以是氮气,二氧化碳或蒸汽。还原性气体和氧化性气体可以以与被处理气体通过的方向相反的方向通过床或其一部分。优选地,至少使用三个受体床,但是最优选地,使用四个平行排列的成对的床,吸收步骤所用的时间基本上等于还原相,氧化相和惰性气体处理所用的时间。 。在图1和图2所示的一个优选实施例中,图1示出了一个实施例。在图1A和2中,受体为单个圆柱形床的形式,该圆柱形床由隔板2a,2b,2c划分成非连通的扇区。进气管线5通过圆锥形延伸部6和可旋转的盘7连接到腔室,该盘具有单个开口,从而三个隔室中的任何一个都可以与进气口对齐。该设备的出口类似地配备,两个盘被同步。圆盘7和8中的孔可以是在圆弧的120度上延伸的狭槽20,或者仅仅是圆孔(图1B,未示出)。氧化,还原和可选地惰性气体以期望的顺序经由管线13、14和15供应,并通过相似的出口阵列离开。各种气体管线的入口和出口功能可以互换。在如图2和图3所示的第二实施例中,第二实施例中,如图3、4和6所示,圆柱形的壳体29具有一个带有壁31的中心空间37,并且壳体和壁之间的环空由不渗透的壁86分成径向的隔室85。从壳体壁的上表面31向下延伸48、49、50将上部区域分成一系列环形区域,并且圆盘41以气密关系旋转在径向桁架60和环形桁架57、58a,58b,58c上的壁的下方,所述径向桁架定位成与所述环形区域相对应。 -viz。 44、45、46和47。这些区域配有入口/出口52、53、54、56,以允许进/出床层的废气/排气,并在圆盘41中设置环形槽42、43、81、84以便将气体导引到适当的区域或从适当的区域引出气体,该气体具有一定的长度,以控制在使用过程中光盘连续旋转时采取此类操作所花费的时间。容器的底部类似地配备有同步旋转盘38。

著录项

  • 公开/公告号GB1367941A

    专利类型

  • 公开/公告日1974-09-25

    原文格式PDF

  • 申请/专利权人 SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ NV;

    申请/专利号GB19710048251

  • 发明设计人

    申请日1971-10-18

  • 分类号B01D53/34;

  • 国家 GB

  • 入库时间 2022-08-23 05:06:04

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