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SEEN TO PROMOTE A CROPP INTENDED FOR THE PRODUCTION OF THERPA OF MONOCRISTAL SKIKT
SEEN TO PROMOTE A CROPP INTENDED FOR THE PRODUCTION OF THERPA OF MONOCRISTAL SKIKT
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机译:旨在促进旨在生产非门皮手术的作物
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1432686 Depositing epitaxial layers PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 11 July 1973 [14 July 1972] 33026/73 Heading B1S A monocrystalline body consisting of a substrate with an epitaxial layer deposited thereon is made by dissolving a surface layer of a monocrystalline substrate material in a melt which consists of a solution of the components of the substrate material dissolved in a flux and then depositing a monocrystalline layer of the substrate material on the resulting surface from a melt which consists of a solution of the components of the substrate material dissolved in a flux. The dissolution of the surface layer and subsequent depository of the layer may be carried out in the same melt. In example I, a plate of gadolinium gallium garnet was treated with a melt of Gd 2 O 3 , Ga 2 O 3 , PbO, and B 2 O 3 at a temperature above the saturation temperature of the melt, the plate removed from the melt and the thinner plate provided with a layer of the composition by liquid phase epitaxy. In example II, a plate of samarium gallium garnet Sm 3 Ga 5 O 12 , was treated in a melt which had a composition of Sm 2 O 3 , Ga 2 O 3 , PbO and B 2 O 3 at a temperature above the saturation temperature of the melt, after which the melt was cooled to below the saturation temperature of the melt and maintained there for 15 minutes. Upon inspection the plate was found to be 100Ám thinner and to have a layer of 10Ám deposited on each side of the plate.
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机译:1432686沉积外延层飞利浦电子及相关工业有限公司1973年7月11日[1972年7月14日] 33026/73标题B1S通过将单晶衬底材料的表面层溶解在衬底中而制得由其上沉积有外延层的衬底组成的单晶体。熔体,其由溶解在助熔剂中的基质材料的组分的溶液组成,然后由熔体沉积在所得表面上的基质材料的单晶层,所述熔体由溶解在助熔剂中的基质材料的组分的溶液组成。表面层的溶解和随后的层沉积可以在同一熔体中进行。在实施例I中,在高于熔体的饱和温度的温度下用Gd 2 O 3,Ga 2 O 3,PbO和B 2 O 3的熔体处理treated镓石榴石板,将该板从熔体中移出。薄板通过液相外延形成有一层组合物。在实施例II中,在高于饱和温度的温度下,在具有Sm 2 O 3,Ga 2 O 3,PbO和B 2 O 3组成的熔体中处理gall镓石榴石Sm 3 Ga 5 O 12板。然后,将其冷却至熔体的饱和温度以下,并在此保持15分钟。经检查,发现该板的厚度薄了100μm,并且在板的两面都沉积了10μm的层。
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