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Tantalum pentoxide dielectric for thin film techniques - produced using pure aq ammonia soln as electrolyte in anodic oxidn
Tantalum pentoxide dielectric for thin film techniques - produced using pure aq ammonia soln as electrolyte in anodic oxidn
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机译:用于薄膜技术的五氧化二钽电介质-使用纯氨水水溶液作为阳极氧化液中的电解质生产
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摘要
Dielectric films for capacitors mfr., used in thin film techniques, esp. for condensers in thin film circuits, comprises anodic oxidn. of a thin Ta film on an insulating substrate plate, using an electroly with a high purity, consisting of an NH3 soln. in twice-distd. water with a specific conductivity of 80-200 mu S/cm. Flawless Ta2O5 films are obtd. The condensers obtd. have a specific insulation resistance of over 1014-1015 ohm. cm at 1/6 of the forming voltage, corresp. to an insulation resistance of over 10+9 ohm, and a surface capacity of ca. 0.2 muF/cm2.
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