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Chemical vapour deposition processes for coating bores of tubes - tantalum coating obtd. by decompsn. of its chloride

机译:用于管孔涂层的化学气相沉积工艺-钽涂层。通过decompsn。其氯化物

摘要

Process for coating hollow bodies, esp. tubes, comprises a chemical vapour deposition process in which the tube is heated in zones to the deposition temp. so that the coating only occurs in the zone at the required temp. In the pref. process, metal-acetylacetonates, -carbonyls or -halides are decomposed in a stream of carrier gas, esp. TaCl5 in a stream of H2 in zones heated to above 600 degrees C to obtain a deposit of Ta, the length of the zones being 1-5 cm. Suitable for coating the bore of a hollow body with substances which cannot be deposited by electroplating, e.g. steel tubes to specification V2A or V4A coated internally with Ta and used in gas-chromatography.
机译:特别是中空物体的涂层工艺。管,包括化学气相沉积过程,其中将管分区域加热到沉积温度。因此,涂层仅在所需温度下发生在该区域中。在首选。在该方法中,金属-乙酰丙酮化物,-羰基或-卤化物在载气流中分解,尤其是。在加热到600摄氏度以上的区域中的H2流中的TaCl5,以获得Ta的沉积物,区域的长度为1-5 cm。适用于在空心体的孔上涂上无法通过电镀沉积的物质,例如规格为V2A或V4A的钢管,内部涂有Ta,用于气相色谱法。

著录项

  • 公开/公告号DE2445564A1

    专利类型

  • 公开/公告日1976-04-01

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE19742445564

  • 发明设计人 HIEBERKONRADDR.RER.NAT.;

    申请日1974-09-24

  • 分类号C23C11/02;G01N31/08;

  • 国家 DE

  • 入库时间 2022-08-23 02:04:33

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