首页>
外国专利>
Bright rhodium-rhenium alloy electrodeposition - from an acid plating bath contg. sulphamic acid, a buffer and a complex-forming agent
Bright rhodium-rhenium alloy electrodeposition - from an acid plating bath contg. sulphamic acid, a buffer and a complex-forming agent
展开▼
机译:明亮的铑-alloy合金电沉积-来自连续的酸性电镀液。氨基磺酸,缓冲剂和复合物形成剂
展开▼
页面导航
摘要
著录项
相似文献
摘要
The electroplating bath comprises =10 g/l sulphamic acid, pref. 50-100 g/l; 0.1-15 g/l Rh, pref. 0.5-5 g/l; 0.2 g/l Re, pref. 100-200 mg/l; is not 100 cm3/l concn. H2SO4, and gives a bright Rh-Re alloy deposit contg. =70 pref. 85 wt.% Rh. Suitable for decorative applications, e.g. silver-ware and jewelry, and also for electronic contacts.
展开▼
机译:所述电镀浴包含≥10g/ l的氨基磺酸,优选。 50-100克/升; 0.1-15 g / l Rh,优选0.5-5克/升; 0.2 g / l Re,优选100-200 mg / l;不大于100 cm3 / l concn。 H2SO4,得到明亮的Rh-Re合金沉积物(续)。 > = 70偏好。 85重量%铑适用于装饰应用,例如银器和珠宝,也用于电子触点。
展开▼