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IMAGING AND DEPTH PROFILE ANALYSIS APPARATUS FOR USE WITH ION SCATTERING SPECTROMETER
IMAGING AND DEPTH PROFILE ANALYSIS APPARATUS FOR USE WITH ION SCATTERING SPECTROMETER
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机译:与离子散射光谱仪配合使用的成像和深度轮廓分析装置
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1506175 Television systems MINNESOTA MINING & MFG CO 28 Feb 1975 [1 March 1974 (2)] 8502/75 Heading H4F [Also in Division H1] In an arrangement for the surface analysis of a sample a beam of ions of known energy and mass is raster scanned over an area of the sample. Primary ions scattered from the sample and having a selected energy are detected and a corresponding signal is generated. In the arrangement illustrated in Fig. 1 the ion beam from ion generator 26 is deflected by potentials on x, y deflector electrodes 57, 114 to provide a raster scan of a sample carried by support 61. Support 61 may carry several samples selectively presentable to the beam. Instead of beam deflection the support may be moved in a raster movement. Ions scattered along a path perpendicular to the ion beam pass via energy analyser 45 to ion detector 70 to generate a corresponding electric signal. The brief pulses in this signal pass via pulse stretcher 136 to c.r.t. display unit 112, the raster scan of the display being controlled by signals from the generators providing the ion beam deflection potentials. The ion beam energy and the energy of the detected scattered ions are selected by adjustment of the voltages applied to the beam generator 26 and ion analyser 45. In another arrangement (Fig. 2, not shown), the signal from the ion detector 70 is passed to a pulse height analyser (142) which feeds an indicator (80). The analyser is enabled only during a part of each scan line to avoid response to the edge of the crater formed in the sample by sputtering. The enabling signal is generated by comparator circuitry (140) which receives the outputs of the ion beam deflection potential generators.
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