首页> 外国专利> Composite electron microscope grid suitable for energy dispersive X-ray analysis, process for producing the same and other micro-components

Composite electron microscope grid suitable for energy dispersive X-ray analysis, process for producing the same and other micro-components

机译:适用于能量色散X射线分析的复合电子显微镜栅格,制造该栅格的方法以及其他微组件

摘要

A composite electron microscope grid for support of specimens and suitable for energy dispersive X-ray analysis is fabricated from a low atomic number composite material comprising a polymer formed from a combination of some or all of carbon, hydrogen, oxygen and nitrogen, to which carbon, preferably in the form of carbon fibers is blended. The dispersed carbon in the polymer strengthens the grid and greatly increases the electrical and thermal conductivity of the resultant grid so as to minimize the otherwise present electron charge buildup in the vicinity of the grid during the electron bombardment associated with the X-ray analysis. The high thermal conductivity of the grid minimizes the temperature rise in the grid and specimen under analysis; thereby ensuring a stable specimen image.PPThe composite grids according to the present invention are fabricated from an etched surfaced mold which is sacrificed after the grid casting. Preferably, the mold is made from a material with a different solubility or chemical resistance than the composite material forming the grid so that the mold can simply be dissolved after use. The mold itself is preferably etched using a photoresistive process for precisely etching the desired grid structure into the mold material. The mold process for making the grid can be utilized for molding other types of micro-components.
机译:一种由低原子序数的复合材料制成的用于支撑样品并适合于能量色散X射线分析的复合电子显微镜格栅,该复合材料包括一种由碳,氢,氧和氮中的一些或全部的组合形成的聚合物。 ,优选以碳纤维的形式进行混合。聚合物中分散的碳增强了栅格,并极大地提高了所得栅格的电导率和导热率,从而最大程度地减少了在与X射线分析相关的电子轰击过程中,在栅格附近形成的电子电荷。格栅的高热导率可最大程度地减少分析中的格栅和样品的温度升高;因此,确保稳定的样本图像。根据本发明的复合格栅是由经蚀刻的表面模具制成的,该模具在格栅浇铸后被牺牲掉。优选地,模具由具有与形成格栅的复合材料不同的溶解度或耐化学性的材料制成,使得模具可以在使用后简单地溶解。模具本身优选地使用光致抗蚀剂工艺蚀刻,以将期望的栅格结构精确地蚀刻到模具材料中。用于制造栅格的模制工艺可用于模制其他类型的微组件。

著录项

  • 公开/公告号US4163900A

    专利类型

  • 公开/公告日1979-08-07

    原文格式PDF

  • 申请/专利权人 CONNECTICUT RES INST INC;

    申请/专利号US19770825243

  • 发明设计人 JOHN B. WARREN;MICHAEL R. KUNDRATH;

    申请日1977-08-17

  • 分类号G01N23/00;

  • 国家 US

  • 入库时间 2022-08-22 19:16:35

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