PHOTO MASK FOR AUTOMATICALLY ALIGNING EXPOSURE AND AUTOMATICALLY ALIGNING EXPOSURE METHOD

摘要

PURPOSE:To enable automatically aligning exposure treatment to be done surely by using the photo mask which has plural parallel slits extending from the side of a polygon to the center of the polygon and having the slits parallel to each side of the polygon near the center of the polygon. CONSTITUTION:A photo mask 22 and a semiconductor wafer 21 respectively have the semiconductor-element-constituting chip patterns 23 and 24 which are disposed in a required number of row and column matrix form and position-detecting patterns 25, 26 are provided in at least two positions of the matrix of the photo mask 22. Target patterns 27, 28 are transferred to the semiconductor wafer. The target patterns have parallel slit columns 31 thru 34 extending from each side of a square to the center and slit columns 41 thru 44 parallel to each side near the center. The reflected light from the target patterns superposes at each side and is transmitted through the position-detecting patterns of the other photo mask having parallel slits on each side, whereby the position is detected.