ELEMENTARY ANALYSIS METHOD BY ION EXCITATION AUGER ELECTRONIC SPECTRAL DIFFRACTION

摘要

PURPOSE:To also measure the distribution of a hydrogen component with metallic components in a sample, by spectroscopically analyzing ion excitation Auger electrons, which are discharged from the sample by irradiating ion beams to the sample, by means of an Auger electronic analysis instrument. CONSTITUTION:The specified analysis spectra of Si, etc. are measured by introducing ion excitation Auger electrons, which are discharged from a sample by irradiating ion beams to the sample, to an Auger electronic analysis instrument. When detecting a condition that hydrogen in an amorphous Si-H alloy is distributed, a sample S is prepared which is manufactured by forming an amorphous Si film containing H in approximate 10atm% on an Si monocrystal substrate 1. The ion beams a of the inert gases of argon, etc. are irradiated to the sample S, and the ion excitation Auger electrons b are discharged. The Auger electrons b are let pass through a variable electric-field passage 2 of a cylindrical electron energy analysis instrument, and a spectrum of Auger electron energy peculiar to the sample is detected by means of a detector 3.