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X-ray analysis position comparison and spectral analysis, comprises altering spectral position of diffraction lines by single defined change in position of test item, and repeating measurement of emission spectrum

机译:X射线分析位置比较和光谱分析,包括通过单个定义的测试项目位置变化来改变衍射线的光谱位置,并重复测量发射光谱

摘要

In a first stage the spectral position of the diffraction lines is altered by a single defined change in the position of the test item, followed by a repeat measurement of the emission spectrum and comparison of the emissions against the two positions. Those parts of the spectrum which remain unchanged are separated and analyzed by conventional X-ray fluorescent analysis. In a first stage the spectral position of the diffraction lines is altered by a single defined change in the position of the test item, followed by a repeat measurement of the emission spectrum and comparison of the emissions against the two positions. Those parts of the spectrum which remain unchanged are separated and analyzed by conventional X-ray fluorescent analysis. The positions measured are determined using the first-stage diffraction lines and determination of the characteristic crystalline values of the test items, and detection of mono-crystalline zones (m) within the test item. The final stage systematically repeats determination of the characteristic crystalline values, and determines the symmetrical elements within the crystal structure and/or the crystal orientation using a conventional crystallography process.
机译:在第一阶段,通过对测试项目的位置进行一次定义的更改来更改衍射线的光谱位置,然后重复测量发射光谱并比较两个位置的发射。保持不变的那些光谱部分通过常规的X射线荧光分析进行分离和分析。在第一阶段,通过对测试项目的位置进行一次定义的更改来更改衍射线的光谱位置,然后重复测量发射光谱并比较两个位置的发射。保持不变的那些光谱部分通过常规的X射线荧光分析进行分离和分析。使用第一阶段衍射线并确定测试项目的特征晶体值,并检测测试项目内的单晶区(m),确定测量位置。最后阶段系统地重复确定特征晶体值,并使用常规晶体学方法确定晶体结构和/或晶体取向内的对称元素。

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