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Method of enhancing epitaxy and preferred orientation in films deposited on solid substrates
Method of enhancing epitaxy and preferred orientation in films deposited on solid substrates
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机译:增强固体衬底上沉积的薄膜的外延和优选取向的方法
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摘要
The invention relates to a method of enhancing epitaxy and preferred orientation in films on solid substrates, which includes forming at predetermined locations, a plurality of artificial point defects or a surface relief structure (7) at the surface of a solid substrate (1). Thereafter a film (8) is deposited on the surface to form a substantially epitaxial or preferred orientation layer in tre film having crystalographic orientation influenced by the geometry of an artificial defect. The orienting influence of the article defects may be enhanged by applying an incident beam of energy (9) to the film (8).
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