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Structural and thermoelectric properties of fine-grained Bi0.4Te3.0Sb1.6 thin films with preferred orientation deposited by flash evaporation method

机译:闪蒸法沉积取向较好的Bi0.4Te3.0Sb1.6细晶粒薄膜的结构和热电性能

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摘要

Structural and thermoelectric properties of p-type fine-grained Bi0.4Te3.0Sb1.6 thin filmsare investigated. The films are deposited by a flash evaporation method and exhibit apreferred orientation in the c-axis direction. By optimizing deposition conditions, weachieve thin films with clean surfaces. Then, in order to enhance the crystallinity withpreferred orientation and the thermoelectric properties of the thin films, they are annealedin hydrogen ambient at atmospheric pressure and temperatures ranging from 200 to 350 oC.The cross-sectional microstructure and crystallinity of the thin films are investigated byscanning electron microscopy and x-ray diffraction, respectively. The electricalconductivity, Seebeck coefficient, and thermoelectric power factor are measured at roomtemperature. We confirm that the grain growth and the crystallization along the c-axis areenhanced as the annealing temperature increases. The highest performance of p-typeBi0.4Te3.0Sb1.6 thin films observed in this study have an annealing temperature of 300 oC,resulting in a thermoelectric power factor of 34.9 W cm-1 K-2 at the average grain size of88 nm. We consider that the synthesis conditions reduce the number of potentialscattering sites at grain boundaries and defects, thus improving the thermoelectric powerfactor.
机译:研究了p型细晶粒Bi0.4Te3.0Sb1.6薄膜的结构和热电性能。膜通过闪蒸法沉积并且在c轴方向上显示出优选的取向。通过优化沉积条件,可获得具有清洁表面的薄膜。然后,为了增强薄膜的最佳取向性和热电性能,在大气压力和200至350 oC的温度下,将它们在室温下退火为氢芳醛氢键。通过扫描研究薄膜的截面微结构和结晶度电子显微镜和X射线衍射。在室温下测量电导率,塞贝克系数和热电功率因数。我们确认,随着退火温度的升高,晶粒沿c轴的生长和结晶得到增强。本研究中观察到的性能最高的p型Bi0.4Te3.0Sb1.6薄膜具有300 oC的退火温度,在88 nm的平均晶粒尺寸下产生34.9 factorW cm-1 K-2的热电功率因数。我们认为,合成条件减少了晶界和缺陷处的电势散射位点的数量,从而提高了热电功率因数。

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