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Compositions based on the precursor of quaternary ammonium of organosiloxane to inhibit the formation of dental plaque

机译:基于有机硅氧烷季铵前体的组合物,可抑制牙菌斑的形成

摘要

{PG,1 A dentifrice composition is provided containing a quaternary ammonium organosiloxane having the formula {r1 {tc,1 {rb {ob,4 {m,1 {s,15 {sd,5 {8 R{HU 1{L {9 {SD,3 {HD 3{SB,16 {AB,4 Si{ab,4 R{HU 2{AB,4 {M,2 {AB,8 R{HU 5{MR,2 {AB,0 R{HU 4{SD,9 {SB,7 {HD {61 {MR,2 N{AB,4 R{HU 3{M,2 {S,15 {MY,1 {CB,4 {S,21 {MY,2 X{HU {63 {RE {PS {PS wherein R{HU 1 {L is an alkoxy group having from 1 to 5 carbon atoms, R{HU 2 {L is an alkylene group having from 1 to 25 carbon atoms, and R{HU 3{L , R{HU 4 {L and R{HU 5 {L are, individually, alkyl groups of from 1 to 25 carbon atoms, and X is an anion, preferably selected from chlorine, bromine fluorine and iodine. A method of inhibiting plaque formation on teeth in an oral environment is also provided.
机译:{PG,1提供了一种洁齿剂组合物,其包含具有式{r1 {tc,1 {rb {ob,4 {m,1 {s,15 {sd,5 {8 R {HU 1 {L { 9 {SD,3 {HD 3 {SB,16 {AB,4 Si {ab,4 R {HU 2 {AB,4 {M,2 {AB,8 R {HU 5 {MR,2 {AB,0 R {HU 4 {SD,9 {SB,7 {HD {61 {MR,2 N {AB,4 R {HU 3 {M,2 {S,15 {MY,1 {CB,4 {S,21 {MY ,2 X {HU {63 {RE {PS {PS,其中R {HU 1 {L是具有1至5个碳原子的烷氧基,R {HU 2 {L是具有1至25个碳原子的亚烷基,和R {HU 3 {L,R {HU 4 {L和R {HU 5 {L分别为具有1至25个碳原子的烷基,并且X为阴离子,优选选自氯,溴氟和碘。还提供了一种在口腔环境中抑制牙齿上的牙斑形成的方法。

著录项

  • 公开/公告号FR2413087B3

    专利类型

  • 公开/公告日1981-09-04

    原文格式PDF

  • 申请/专利权人 MINNESOTA MINING MANUFACTURING;

    申请/专利号FR19780036649

  • 发明设计人

    申请日1978-12-28

  • 分类号A61K7/22;

  • 国家 FR

  • 入库时间 2022-08-22 15:06:02

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