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Compositions based on the precursor of quaternary ammonium of organosiloxane to inhibit the formation of dental plaque
Compositions based on the precursor of quaternary ammonium of organosiloxane to inhibit the formation of dental plaque
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机译:基于有机硅氧烷季铵前体的组合物,可抑制牙菌斑的形成
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摘要
{PG,1 A dentifrice composition is provided containing a quaternary ammonium organosiloxane having the formula {r1 {tc,1 {rb {ob,4 {m,1 {s,15 {sd,5 {8 R{HU 1{L {9 {SD,3 {HD 3{SB,16 {AB,4 Si{ab,4 R{HU 2{AB,4 {M,2 {AB,8 R{HU 5{MR,2 {AB,0 R{HU 4{SD,9 {SB,7 {HD {61 {MR,2 N{AB,4 R{HU 3{M,2 {S,15 {MY,1 {CB,4 {S,21 {MY,2 X{HU {63 {RE {PS {PS wherein R{HU 1 {L is an alkoxy group having from 1 to 5 carbon atoms, R{HU 2 {L is an alkylene group having from 1 to 25 carbon atoms, and R{HU 3{L , R{HU 4 {L and R{HU 5 {L are, individually, alkyl groups of from 1 to 25 carbon atoms, and X is an anion, preferably selected from chlorine, bromine fluorine and iodine. A method of inhibiting plaque formation on teeth in an oral environment is also provided.
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机译:{PG,1提供了一种洁齿剂组合物,其包含具有式{r1 {tc,1 {rb {ob,4 {m,1 {s,15 {sd,5 {8 R {HU 1 {L { 9 {SD,3 {HD 3 {SB,16 {AB,4 Si {ab,4 R {HU 2 {AB,4 {M,2 {AB,8 R {HU 5 {MR,2 {AB,0 R {HU 4 {SD,9 {SB,7 {HD {61 {MR,2 N {AB,4 R {HU 3 {M,2 {S,15 {MY,1 {CB,4 {S,21 {MY ,2 X {HU {63 {RE {PS {PS,其中R {HU 1 {L是具有1至5个碳原子的烷氧基,R {HU 2 {L是具有1至25个碳原子的亚烷基,和R {HU 3 {L,R {HU 4 {L和R {HU 5 {L分别为具有1至25个碳原子的烷基,并且X为阴离子,优选选自氯,溴氟和碘。还提供了一种在口腔环境中抑制牙齿上的牙斑形成的方法。
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