首页> 外国专利> PROCESS AND APPARATUS FOR GROWING MERCURY CADMIUM TELLURIDE LAYER BY LIQUID PHASE EPITAXY FROM MERCURY-RICH MELT

PROCESS AND APPARATUS FOR GROWING MERCURY CADMIUM TELLURIDE LAYER BY LIQUID PHASE EPITAXY FROM MERCURY-RICH MELT

机译:富汞熔体中液相液相法生长汞碲化镉层的方法和装置

摘要

A process and apparatus for growing a layer of mercury cadmium telluride (HgCdTe) on a substrate is used in the fabrication of infrared detectors. The growth of a layer of HgCdTe by liquid phase epitaxy from a melt comprising mercury, cadmium, and tellurium requires a relatively high temperature which causes the mercury to constantly vaporize from the melt, thereby constantly changing the composition of the melt and the HgCdTe layer grown from the melt. This problem is overcome by providing a mercury-rich melt and also by condensing mercury vapors escaping from the melt and returning the mercury to the melt. First, a crystal growth melt (36) comprising mercury, cadmium and tellurium is provided in a vertically-oriented crystal growth chamber (14). The melt (36) comprises 33.33 mole percent or more of mercury and is maintained at a predetermined temperature above the liquidus termperature thereof. A condensing means (such as 15) is provided atop the crystal growth chamber (14) in order to condense vapors of mercury which escape from the melt (36) and to return this condensed mercury to themelt, to thereby maintain the melt at a constant composition. The substrate (not shown) in the substrate holder (22) is contacted with this crystal growth melt (36) for a predetermined period of time while cooling the melt below its liquidus temperature at a predetermined rate sufficient to cause the crystal growth of the layer of HgCdTe on the substrate to a desired thickness. The layer of HgCdTe so formed is of uniform composition and of high purity and is formed at a relatively low growth temperature and relatively low system pressure.
机译:用于在衬底上生长一层碲化汞镉(HgCdTe)的工艺和设备用于制造红外探测器。通过液相外延从包含汞,镉和碲的熔体中生长HgCdTe层需要相对较高的温度,这导致汞不断从熔体中蒸发,从而不断改变熔体和生长的HgCdTe层的组成从融化。通过提供富含汞的熔体并且还通过冷凝从熔体逸出的汞蒸气并将汞返回熔体来克服该问题。首先,在垂直取向的晶体生长室(14)中提供包含汞,镉和碲的晶体生长熔体(36)。熔体(36)包含33.33摩尔%或更多的汞,并被维持在高于其液相线温度的预定温度。在晶体生长室(14)的顶部设置冷凝装置(例如15),以冷凝从熔体(36)逸出的汞蒸气并使该冷凝的汞返回到主熔体,从而使熔体保持恒定。组成。使基板保持器(22)中的基板(未示出)与该晶体生长熔体(36)接触预定的时间段,同时以足以引起该层的晶体生长的预定速率将熔体冷却至其液相线温度以下。在衬底上将HgCdTe沉积到所需的厚度。这样形成的HgCdTe层具有均匀的组成和高的纯度,并且在相对低的生长温度和相对低的系统压力下形成。

著录项

  • 公开/公告号WO8201671A1

    专利类型

  • 公开/公告日1982-05-27

    原文格式PDF

  • 申请/专利权人 SANTA BARBARA RESEARCH CENTER;

    申请/专利号WO1981US01427

  • 发明设计人 LOCKWOOD ARTHUR H.;

    申请日1981-10-21

  • 分类号B05C3/02;

  • 国家 WO

  • 入库时间 2022-08-22 13:11:18

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