首页> 外国专利> PROCESS AND APPARATUS FOR GROWING MERCURY CADMIUM TELLURIDE LAYER BY LIQUID PHASE EPITAXY FROM MERCURY-RICH MELT.

PROCESS AND APPARATUS FOR GROWING MERCURY CADMIUM TELLURIDE LAYER BY LIQUID PHASE EPITAXY FROM MERCURY-RICH MELT.

机译:通过富硫熔体的液相相表皮生长汞碲化镉层的方法和装置。

摘要

The specification discloses a process and apparatus for forming a layer of mercury cadmium telluride of predetermined composition on the surface of a selected substrate by first providing a crystal growth melt comprising mercury, cadmium, and tellurium in a vertically-oriented crystal growth chamber. The melt comprises 33.33 mole percent or more of mercury and is maintained at a predetermined temperature above the liquidus temperature thereof. A condensing means is provided atop the crystal growth chamber in order to condense vapors of mercury which escape from the melt and to return this condensed mercury to the melt, to thereby maintain the melt at a constant composition. The substrate is contacted with this crystal growth melt for a predetermined period of time while cooling the melt below its liquidus temperature at a predetermined rate sufficient to cause the crystal growth of the layer of mercury cadmium telluride on the substrate to a desired thickness. The layer of mercury cadmium telluride so formed is of uniform composition and of high purity and is formed at a relatively low growth temperature and relatively low system pressure.
机译:该说明书公开了一种方法和设备,该方法和设备用于通过首先在垂直取向的晶体生长室中提供包含汞,镉和碲的晶体生长熔体,在所选衬底的表面上形成预定组成的碲化汞镉镉层。熔体包含33.33摩尔%或更多的汞,并被维持在高于其液相线温度的预定温度。在晶体生长室的顶部设置冷凝装置,以冷凝从熔体中逸出的汞蒸气并使该冷凝的汞返回熔体,从而使熔体保持恒定的组成。使基板与该晶体生长熔体接触预定的时间段,同时以足以使基板上的碲化汞镉镉层的晶体生长至所需厚度的预定速率将熔体冷却至其液相线温度以下。这样形成的碲化汞镉层具有均匀的组成和高的纯度,并且是在较低的生长温度和较低的系统压力下形成的。

著录项

  • 公开/公告号EP0064514A4

    专利类型

  • 公开/公告日1985-11-21

    原文格式PDF

  • 申请/专利权人 SANTA BARBARA RESEARCH CENTER;

    申请/专利号EP19810902995

  • 发明设计人 LOCKWOOD ARTHUR H.;

    申请日1981-10-21

  • 分类号B05C3/02;

  • 国家 EP

  • 入库时间 2022-08-22 07:36:24

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