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A process for the image pattern generation by electron beam scanning and electron beam exposure device -
A process for the image pattern generation by electron beam scanning and electron beam exposure device -
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机译:通过电子束扫描和电子束曝光装置生成图像图案的方法-
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摘要
the invention concerns a method for bildmustererzeugung by elektronenstrahlabtastung and an electron beam belichtungsvorrichtung. erfindungsgemäß, the sample (6), the benchmark figures (10) is to dete
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