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Method for radiation hardening semiconductor devices and integrated circuits to latch-up effects

机译:用于使半导体器件和集成电路辐射硬化以闩锁效应的方法

摘要

A method for eliminating the latch-up effect in integrated circuits having parasitic pnpn structures has been described comprising the step of irradiating the circuit with high energy particulate ions to provide low lifetime regions in the circuit to lower parasitic transistor gain. PPThe invention overcomes the problem of latch-up effect in integrated circuits where parasitic pnpn structures act as thyristors or silicon-controlled rectifiers which provide a low impedance path across the pnpn structure when the thyristor or silicon-controlled rectifier is turned on such as by transient ionizing radiation or by transient circuit voltages which forward bias the external junctions of the pnpn structure.
机译:已经描述了消除具有寄生pnpn结构的集成电路中的闩锁效应的方法,该方法包括以下步骤:用高能微粒离子照射电路,以在电路中提供低寿命区域以降低寄生晶体管增益。

本发明克服了集成电路中的闩锁效应的问题,在该集成电路中,寄生的pnpn结构充当晶闸管或可控硅整流器,当晶闸管或可控硅整流器处于寄生状态时,它们提供跨pnpn结构的低阻抗路径例如通过瞬态电离辐射或通过向前偏置pnpn结构的外部结的瞬态电路电压来开启。

著录项

  • 公开/公告号US4318750A

    专利类型

  • 公开/公告日1982-03-09

    原文格式PDF

  • 申请/专利权人 WESTINGHOUSE ELECTRIC CORP.;

    申请/专利号US19790107966

  • 发明设计人 PROSENJIT RAI-CHOUDHURY;JOHN BARTKO;

    申请日1979-12-28

  • 分类号H01L21/263;H01L21/22;H01L7/54;

  • 国家 US

  • 入库时间 2022-08-22 12:14:03

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