Semiconductor vapor phase deposition apparatus (半導體 氣相 成長 裝置)

摘要

The appts. comprises a furnace, gas supply, heater, pipe network, valve and control appts., and a modifying operating program. The control appts. has a first and second memory device. The first memory device comprises a process program group, which contains time, temp. and amount of gas information. The second memory device stores the system program, which decodes the process program group and sends the control signal to the valve appts.