首页> 外国专利> Process for eletrodeposicao of sheet copper of highly flattened, Ductil, brilliant, substantially uniform, hard and not recozivel on a substrate conductor.And the plate as well as deposit of copper bright

Process for eletrodeposicao of sheet copper of highly flattened, Ductil, brilliant, substantially uniform, hard and not recozivel on a substrate conductor.And the plate as well as deposit of copper bright

机译:高度扁平化,Ductil,光亮,基本均匀,坚硬且不会再沉积在基材导体上的薄板铜的电镀工艺,以及镀层和铜的沉积

摘要

An aqueous acidic solution contains copper in an amount sufficient to electrodeposit copper on a substrate and a controlled combination of bath soluble and compatible organic brightening agents including: (1) one or more organic polyether compounds; (2) one or more organic sulphide compounds; and (3) at least one compound selected from each of: (A) A 5-phenylphenazinium derivative having the formula: IMAGE (B) a substituted phthalocyanine, and (C) an alkylated polyethyleneimine reaction product having a quaternary nitrogen. The bath enables the deposition of a non-annealing engineering copper plate suitable for mechanical engraving. The plate may be on a rotogravure cylinder.
机译:酸性水溶液包含足以在基材上电沉积铜的量的铜和浴溶性和相容性有机增白剂的受控组合,其包括:(1)一种或多种有机聚醚化合物; (2)一种或多种有机硫化物; (3)选自以下的至少一种化合物:(A)具有下式的5-苯基吩嗪鎓衍生物:(B)取代的酞菁,和(C)具有季氮的烷基化聚乙烯亚胺反应产物。熔池能够沉积适合机械雕刻的非退火工程铜板。该板可以在凹版印刷滚筒上。

著录项

  • 公开/公告号BR8402812A

    专利类型

  • 公开/公告日1985-05-21

    原文格式PDF

  • 申请/专利权人 OMI INTERNATIONAL CORPORATION;

    申请/专利号BR19848402812

  • 发明设计人 DANIEL J. COMBS;

    申请日1984-06-08

  • 分类号C25D3/38;C25D7/04;

  • 国家 BR

  • 入库时间 2022-08-22 08:19:29

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