首页> 外国专利> FOER FARERANDE OCH FRAMKALLNINGSLOESNING FOERFAMANDNING AV BELYSTA NEGATIVT FUNGERANDE DIAZONIUMSALTSKIKT

FOER FARERANDE OCH FRAMKALLNINGSLOESNING FOERFAMANDNING AV BELYSTA NEGATIVT FUNGERANDE DIAZONIUMSALTSKIKT

机译:轻负重氮盐层的加工和开发解决方案的优势

摘要

This invention relates to a developer solution for the development of exposed light-sensitive reproduction layers comprising a water-insoluble binder and a water-insoluble diazonium salt polycondensation product. As the essential constituents, this developer solution contains glycol ethers, glycol esters and water, in detail-about 30 to 80% of a compound of the formula IMAGE wherein n=1 to 4 and m=1 to 5; about 3 to 30% of a compound of the formula IMAGE wherein R1 and R2 are acyl groups containing 1 to 4 carbon atoms, or one of the two groups is a hydrogen atom and R3 is a hydrogen atom or a methyl group; about 0 to 15% of 1,3-dioxolane-2-one or 4-methyl-1,3-dioxolane-2-one; about 0 to 20% of a polyhydric alcohol; about 0 to 10% of an organic or inorganic salt which is soluble in the solvent mixture; and about 5 to 45% of water. The invention relates further to a process for the development of negative-working reproduction layers based on (a) water-insoluble diazonium salt polycondensation products and (b) binders which are insoluble in water and in dilute aqueous alkaline solutions. In the process, the exposed reproduction layer is treated with the above-specified developer solution in order to dissolve the unexposed layer areas.
机译:本发明涉及用于显影曝光的感光再现层的显影剂溶液,其包含水不溶性粘合剂和水不溶性重氮盐缩聚产物。作为必需成分,该显影剂溶液包含乙二醇醚,乙二醇酯和水,具体地讲,大约为30至80%的式的化合物,其中n = 1至4且m = 1至5;式的化合物的约3至30%,其中R1和R2为含1-4个碳原子的酰基,或两个基团之一为氢原子,R3为氢原子或甲基;约0至15%的1,3-二氧戊环-2-一或4-甲基-1,3-二氧戊环-2-一;约0至20%的多元醇;溶于溶剂混合物中的有机或无机盐的约0-10%;和大约5至45%的水。本发明还涉及基于(a)不溶于水的重氮盐缩聚产物和(b)不溶于水和稀碱水溶液的粘合剂开发负片复制层的方法。在该过程中,用上述显影剂溶液处理曝光的再现层,以溶解未曝光的层区域。

著录项

  • 公开/公告号FI66697C

    专利类型

  • 公开/公告日1984-11-12

    原文格式PDF

  • 申请/专利权人 HOECHST AG;

    申请/专利号FI19810000955

  • 发明设计人 SCHELL LONI;

    申请日1981-03-27

  • 分类号G03C5/34;

  • 国家 FI

  • 入库时间 2022-08-22 08:16:42

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