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FOER FARERANDE OCH FRAMKALLNINGSLOESNING FOERFAMANDNING AV BELYSTA NEGATIVT FUNGERANDE DIAZONIUMSALTSKIKT
FOER FARERANDE OCH FRAMKALLNINGSLOESNING FOERFAMANDNING AV BELYSTA NEGATIVT FUNGERANDE DIAZONIUMSALTSKIKT
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机译:轻负重氮盐层的加工和开发解决方案的优势
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摘要
This invention relates to a developer solution for the development of exposed light-sensitive reproduction layers comprising a water-insoluble binder and a water-insoluble diazonium salt polycondensation product. As the essential constituents, this developer solution contains glycol ethers, glycol esters and water, in detail-about 30 to 80% of a compound of the formula IMAGE wherein n=1 to 4 and m=1 to 5; about 3 to 30% of a compound of the formula IMAGE wherein R1 and R2 are acyl groups containing 1 to 4 carbon atoms, or one of the two groups is a hydrogen atom and R3 is a hydrogen atom or a methyl group; about 0 to 15% of 1,3-dioxolane-2-one or 4-methyl-1,3-dioxolane-2-one; about 0 to 20% of a polyhydric alcohol; about 0 to 10% of an organic or inorganic salt which is soluble in the solvent mixture; and about 5 to 45% of water. The invention relates further to a process for the development of negative-working reproduction layers based on (a) water-insoluble diazonium salt polycondensation products and (b) binders which are insoluble in water and in dilute aqueous alkaline solutions. In the process, the exposed reproduction layer is treated with the above-specified developer solution in order to dissolve the unexposed layer areas.
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