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Method of reduction of a compound forming a layer on a substrate and the application of said method to the fabrication of a field-effect semiconducting structure

机译:减少在衬底上形成层的化合物的方法,以及所述方法在制造场效应半导体结构中的应用

摘要

The method of reduction comprises two successive steps. The first step consists in forming an electrolyte layer at the surface of the layer to be reduced which is an oxidized surface layer of a substrate. During the second step, the layer is reduced through the layer of electrolyte which is an ionic conductor for the ionizing species. The second step is carried out in a first variant by thermal reduction in a reducing atmosphere and in a second variant by exposure to a reducing plasma.
机译:还原方法包括两个连续的步骤。第一步包括在要还原的层的表面上形成电解质层,该电解质层是基底的氧化表面层。在第二步中,该层通过电解质层被还原,电解质层是电离物质的离子导体。在第一变体中,通过在还原性气氛中进行热还原来进行第二步骤,在第二变体中,通过暴露于还原性等离子体来进行第二步骤。

著录项

  • 公开/公告号US4521951A

    专利类型

  • 公开/公告日1985-06-11

    原文格式PDF

  • 申请/专利权人 THOMSON-CSF;

    申请/专利号US19830506994

  • 发明设计人 LOUIS MERCANDALLI;MICHEL CROSET;

    申请日1983-06-23

  • 分类号H01L21/20;H01L21/31;

  • 国家 US

  • 入库时间 2022-08-22 07:52:32

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