REFLECTION PREVENTING FILM FOR USE IN MANUFACTURE OF SEMICONDUCTOR DEVICE, METHOD AND SOLUTION FOR MANUFACTURING REFLECTION PREVENTING FILM OF THIS TYPE AND USE THEREOF FOR ABSORPTION OF LIGHT BY ULTRAVIOLET PHOTOGRAPHIC LITHOGRAPHY

摘要

Disclosed are antireflective layers for use in the manufacture of semi- conductor devices, methods and solutions for making such antireflective layers, and the use of such antireflective layers to absorb light in ultraviolet photolithography. The antireflective layers that are utilized comprise a polyphenylquinoxaline.