首页>
外国专利>
Electron beam/optical hybrid lithographic resist process in acoustic wave devices
Electron beam/optical hybrid lithographic resist process in acoustic wave devices
展开▼
机译:声波器件中的电子束/光学混合光刻胶工艺
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method is disclosed for using a combination of electron beam and photo lithography in making a acoustic wave device. The process is preformed by first using a positive photoresist and electron beam writing to designate the fine lines required in acoustic wave devices. Next, a second photoresist and optical lithography are used to delineate the pad areas.
展开▼