首页> 外国专利> GALLIUM ARSENIDE MATERIAL AND PROCESS EVALUATION BY MEANS OF PULSED PHOTOCONDUCTANCE IN TEST DEVICES

GALLIUM ARSENIDE MATERIAL AND PROCESS EVALUATION BY MEANS OF PULSED PHOTOCONDUCTANCE IN TEST DEVICES

机译:测试装置中脉冲光电导法测定砷化镓材料及其工艺

摘要

A method is disclosed for determining characteristics of semi- insulating gallium arsenide that can be used to evaluate the suitability of the material for semiconductor processing. An n-channel test device formed on a substrate of semi-insulating gallium arsenide is illuminated with pulses of light. The decay in the photoconductance that occurs due to the illumination is measured in order to enable characterization of the shallow acceptor impurities which compensate the deep donors in the semi-insulating gallium arsenide.
机译:公开了一种用于确定半绝缘砷化镓的特性的方法,该方法可用于评估材料对半导体加工的适用性。用光脉冲照射在半绝缘砷化镓衬底上形成的n通道测试设备。测量由于照明而发生的光电导的衰减,以便能够表征能够补偿半绝缘砷化镓中较深施主的浅受体杂质。

著录项

  • 公开/公告号USH111H

    专利类型

  • 公开/公告日1986-08-05

    原文格式PDF

  • 申请/专利权人

    申请/专利号US19850806573

  • 发明设计人 LARRY D. FLESNER;

    申请日1985-11-21

  • 分类号G05B23/00;

  • 国家 US

  • 入库时间 2022-08-22 07:28:35

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