首页> 外国专利> FORMATION OF ANTIREFLECTION FILM RESISTANT TO LASER DAMAGE AND HAVING HIGH WEAR RESISTANCE ON OPTICAL ELEMENT SURFACE

FORMATION OF ANTIREFLECTION FILM RESISTANT TO LASER DAMAGE AND HAVING HIGH WEAR RESISTANCE ON OPTICAL ELEMENT SURFACE

机译:抗激光损伤的抗反射膜的形成,并在光学元件表面具有高耐磨性

摘要

PURPOSE:To obtain the titled antireflection film resistant to laser damage and having high resistance to wear by mixing a metallic alcoholate into the dispersion of colloidal silica in an org. solvent or water, hydrolyzing and partially condensation-polymerizing a liq. mixture obtained by dissolving the mixture in an org. solvent to obtain a sol soln., coating the sol soln. on the surface of an optical element and heat-treating the element. CONSTITUTION:One or =2 kinds of metallic alcoholates is mixed into the dispersion of colloidal silica in water or an org. solvent, the mixture is dissolved in an org. solvent and the liq. mixture is hydrolyzed and partially condensation-polymerized to obtain a sol soln. The sol soln. is coated on the surface of an optical element and the element is heat-treated. Consequently, a vitreous coated film contg. silica fine particles is formed on the surface of the optical element. The coated film acts as an antireflection film having high resistance to wear and resistant to laser damage. A substance expressed by the formula, Me(OR)n (Me is a metallic element such as Si, Al, Na and B and R is an alkyl group such as CH3, C2H5, C3H5, C3H7 and C4H9). is preferably used as the metallic alcoholate.
机译:用途:通过将金属醇化物混入有机硅胶体二氧化硅的分散体中,获得耐激光损伤且具有高耐磨性的标题抗反射膜。溶剂或水,将液体水解并部分缩聚。通过将混合物溶解在有机溶剂中获得的混合物。溶剂以获得溶胶溶液,然后涂覆溶胶溶液。在光学元件的表面上进行热处理。组成:一种或> = 2种金属醇盐被混合到胶体二氧化硅在水或有机物中的分散体。溶剂,将混合物溶解在有机溶剂中。溶剂和液体。将混合物水解并部分缩聚以得到溶胶溶液。溶胶溶液。将其涂覆在光学元件的表面上并对该元件进行热处理。因此,玻璃态涂膜连续。在光学元件的表面上形成二氧化硅微粒。涂膜用作抗反射膜,其具有高耐磨性和耐激光损伤性。由式Me(OR)n表示的物质(Me是金属元素,例如Si,Al,Na和B,R是烷基,例如CH3,C2H5,C3H5,C3H7和C4H9)。优选用作金属醇化物。

著录项

  • 公开/公告号JPS6217044A

    专利类型

  • 公开/公告日1987-01-26

    原文格式PDF

  • 申请/专利权人 HOYA CORP;

    申请/专利号JP19850152311

  • 发明设计人 IZUMITANI TETSUO;HATA CHIEKO;HARA KOICHI;

    申请日1985-07-12

  • 分类号C03C17/02;G02B1/10;G02B1/111;G02B1/14;H01S3/034;H01S3/08;

  • 国家 JP

  • 入库时间 2022-08-22 07:26:59

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