OPTICAL FILM AND ITS FORMATION, ANTIREFLECTION FILM AND ITS FORMATION, REFLECTION FILM AND ITS FORMATION AND OPTICAL ELEMENT HAVING OPTICAL FILM

摘要

PURPOSE:To widely change refractive indices by growth conditions by providing multilayered structures of low-refractive index layers and high-refractive index layers consisting of titanium oxynitride. CONSTITUTION:A semiconductor layer 21 has a structure obtd. by holding an active layer 23 with two clad layer 22, 24. The antireflection films 25 consisting of a high- refractive index optical film 26 and a low-refractive index optical film 27 are formed at its one end and the reflection films 28 consisting of a high-refractive index optical film 29 and a low-refractive index optical film 30 are formed at the other end. The titanium oxynitride(TiON) which is a dielectric substance and other oxynitride compds. are used without using ZnS, etc., as the optical film materials of the high refractive index constituting the reflection films 28 having the multilayered structure and the antireflection films 25 having the multilayered structure. An ion assist vapor deposition method which is low in a heating temp. of a substrate to be stuck with the TiON, is good in the adhesion property of the TiON to the substrate and is capable of operating the refractive index of the TiON is used as the method for forming the oxynitride.