DEVELOPING DEVICE FOR POSITIVE-TYPE RESIST

摘要

PURPOSE:To enable a sufficient amount of developing solution to be utilized, by holding the developing solution inside a gap for holding the developing solution by surface tension between an upper plate and a material processed. CONSTITUTION:A material processed 30 is held on a plate 11 in a holding board, with resist 20 positioned above. Then, an upper plate 40 is lowered to approximate to the material processed 30 and narrow a developing solution holding gap h. Then, the developing solution 50 is held inside the gap h by surface tension between the upper plate 40 and the resist 20 when the developing solution is dipped from a nozzle 60 so that the developing solution 50 is supplied into the gap h and the upper plate 40 is moved upward little by little to widen the gap h. Thus, a sufficient amount of developing solution 50 can be utilized to perform the developing of the resist 20. Therefore, time required for the developing can be shortened.