首页> 外国专利> PREPARATION OF COMPOUND SEMICONDUCTOR SINGLE CRYSTAL HAVING UNIFORM CHARACTERISTIC

PREPARATION OF COMPOUND SEMICONDUCTOR SINGLE CRYSTAL HAVING UNIFORM CHARACTERISTIC

机译:具有均匀特性的复合半导体单晶的制备

摘要

PURPOSE:To make electric characteristics uniform not only in the direction of crystal face but also in the axial direction of the single crystal by cooling an ingot of a compound semiconductor single crystal after completing crystal growth in a device for the crystal growth to a specified temp. then subjecting to annealing in inert gas or in vacuum. CONSTITUTION:An ingot of a compound semiconductor single crystal is cooled after completing crystal growth temporarily to a temp. by 600-900 deg.C lower temp. than its m.p. in a crystal growth device. Then, it is heated-treated at 700-1,000 deg.C for 6-60hr in inert gas or an vacuum. By introducing, as described above, a step to cool by 600-900 deg.C lower temp. than the m.p. temporarily without cooling to room temp., the effect as described above is obtd.
机译:目的:通过在完成晶体生长的装置中将化合物半导体单晶的晶锭冷却至指定温度后,通过冷却化合物半导体单晶的晶锭,使电特性不仅在晶面方向而且在单晶轴向均一。然后在惰性气体或真空中进行退火。组成:化合物半导体单晶锭在暂时完成晶体生长至一定温度后被冷却。降低600-900摄氏度比它的熔点在晶体生长装置中。然后,将其在惰性气体或真空中于700-1,000℃下热处理6-60小时。如上所述,通过引入将温度降低至600-900℃的步骤。比国会议员暂时不冷却至室温,上述效果将消失。

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