首页> 外国专利> METHOD OF MANUFACTURING HIGH DENSITY SILICON NITRIDE HAVING HIGH TEMPERATURE STRENGTH AND ANTIIOXIDATION AND CONTAINING Y203 AND AL203

METHOD OF MANUFACTURING HIGH DENSITY SILICON NITRIDE HAVING HIGH TEMPERATURE STRENGTH AND ANTIIOXIDATION AND CONTAINING Y203 AND AL203

机译:制备具有高温强度和抗氧化性并含有Y203和AL203的高密度氮化硅的方法

摘要

The addition of controlled amounts of Al2O3 to high purity Si3N4 powder (containing less than 0.1 weight percent cation impurities and containing Y2O3 as a densifying additive) enables shorter sintering times to achieve polycrystalline Si3N4 bodies having densities approaching theoretical density, while a postsintering crystallization heat treatment results in strengths at high temperatures not otherwise obtainable in the presence of Al2O3. Resulting Si3N4 bodies are useful as engine parts and components or a regenerator or recuperator structures for waste heat recovery. In addition, such Si3N4 bodies containing Al2O3 exhibit good oxidation resistance.
机译:向高纯度Si3N4粉末(含有少于0.1重量%的阳离子杂质并含有Y2O3作为致密化添加剂)中添加受控量的Al2O3,可以缩短烧结时间,以实现密度接近理论密度的多晶Si3N4体,同时进行烧结后结晶热处理。导致在Al2O3存在下无法获得的高温强度。所得的Si 3 N 4体可用作发动机零件和组件或用于废热回收的蓄热器或同流换热器结构。另外,这种含有Al 2 O 3的Si 3 N 4体表现出良好的抗氧化性。

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