WET PROCESS FOR DEVELOPING STYRENE POLYMER RESISTS FOR SUBMICRON LITHOGRAPHY

• 1. 用于从形成溴化苯乙烯类聚合物的反应混合物中回收溴化苯乙烯类聚合物和/或将这种混合物转化为颗粒或者小粒或锭剂的加工技术 [P] . 中国专利： CN101490106B . 2013.04.17
• 2. 用于从形成溴化苯乙烯类聚合物的反应混合物中回收溴化苯乙烯类聚合物和/或将这种混合物转化为颗粒或者小粒或锭剂的加工技术 [P] . 中国专利： CN101490106A . 2009-07-22
• 3. WET PROCESS FOR DEVELOPING STYRENE POLYMER RESISTS FOR SUBMICRON LITHOGRAPHY [P] . 英国专利： GB2167686B . 1987-10-14

  机译： 亚微米光刻技术中用于开发苯乙烯聚合物的湿法工艺

• 4. Wet process for developing styrene polymer resists for submicron lithography [P] . 美国专利： US4587203A . 1986-05-06

  机译： 湿法开发用于亚微米光刻的苯乙烯聚合物抗蚀剂

• 5. WET PROCESS FOR DEVELOPING STYRENE POLYMER RESISTS FOR SUBMICRON LITHOGRAPHY [P] . 英国专利： GB2167686A . 1986-06-04

  机译： 亚微米光刻技术中用于开发苯乙烯聚合物的湿法工艺

• 1. Novel deep—submicron x—ray lithography process for T—shaped gate patterns [J] . XieChangqing, YiFuting, 等 北京同步辐射装置：英文版 . 2001,第001期
• 2. PHASE SEPARATION AND MICROVOID FORMATION AT PHASE INTERFACES OF HYDROPHOBIC-HYDROPHILIC POLYMER BLENDS DURING WET PROCESSING [J] . 郑亚国, 周鈜 东华大学学报：英文版 . 1989,第0Z1期
• 3. Wet-developed high-aspect-ratio resist patterns by 20-keV e-beam lithography [C] . Andre P. Weill, France Telecom/CNET, Meylan Cedex, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing . 1991
• 4. The design, synthesis, and evaluation of novel dendritic polymers as resist materials for next generation lithography. [D] . Tully, David Charles. 2001
• 5. Electron-beam lithography for polymer bioMEMS with submicron features [O] . Kee Scholten, Ellis Meng 2016
• 6. Friction and wear behaviour of copper reinforced acrylonitrile butadiene styrene based polymer composite developed by fused deposition modelling process [O] . R. Keshavamurthy, Vijay Tambrallimath, Abhinandan Badari, 2020
• 7. Self-Developing Polysilane Deep-UV Resists - Photochemistry, Photophysics, and Submicron Lithography [R] . Zeigler, J. M., Harrah, L. A., Johnson, A. W. 1985

• 1. PMMA Polymer Membrane-Based Single Cylindrical Submicron Pores: Electrical Characterization and Investigation of Their Applicability in Resistive-Pulse Biomolecule Detection [J] . Sven Achenbach ,Manouchehr Hashemi ,Banafsheh Moazed . 美国分析化学（英文） . 2012,第8期
• 2. MACROPROCESS OF PARTICLE FORMATION IN SUSPENSION POLYMERIZATION OF STYRENE WITH INORGANIC STABILIZER SYSTEM [J] . 方仕江 ,潘仁云 ,周其云 . 中国化学工程学报：英文版 . 1993,第1期
• 3. Biodegradation of Styrene-Butadiene-Styrene Coploymer via Sugars Attached to the Polymer Chain [J] . Rakesh Singh ,Rishi Gupta ,Mukund G. Adsul . 材料物理与化学进展（英文） . 2013,第2期
• 4. X射线光刻技术制作深亚微米T型栅的实用化研究 [C] . 谢常青 ,陈大鹏 ,李兵 . 第十二届全国化合物半导体材料、微波器件和光电器件学术会议 . 2002
• 5. 含硅侧链聚合物给体及基于四苯乙烯半导体小分子的设计分别应用于有机/钙钛矿太阳能电池 [A] . 黄斌 . 2020