MAGNETRON SPUTTER COATING SOURCE FOR BOTH MAGNETIC AND NONMAGNETIC TARGET MATERIALS

• 1. 一种兼容磁性靶材和非磁性靶材的磁控溅射阴极 [P] . 中国专利： CN113897583A . 2022-01-07
• 2. 一种磁控溅射镀膜磁性靶材 [P] . 中国专利： CN214782106U . 2021-11-19
• 3. MAGNETRON SPUTTER COATING SOURCE FOR BOTH MAGNETIC AND NONMAGNETIC TARGET MATERIALS [P] . CA1242991A . 1988-10-11

  机译： 磁性和非磁性靶材的磁控溅射镀膜源

• 4. Magnetron sputter coating source for both magnetic and nonmagnetic target materials [P] . 英国专利： GB2144772A . 1985-03-13

  机译： 用于磁性和非磁性靶材的磁控溅射涂层源

• 5. A magnetron sputtering - - coating source for magnetic and non-magnetic target - materials [P] . 德国专利： DE3425344A1 . 1985-01-31

  机译： 磁控溅射-磁性和非磁性靶材的涂层源

• 1. A SMALL UNBALANCED MAGNETRON SPUTTERING SOURCE WITH MULTIPOLE MAGNETIC FIELD ANODE [J] . 郑思孝, 孙官清, 等 核技术：英文版 . 1994,第002期
• 2. Effects of Bias Voltage on the Structure and Mechanical Properties of Thick CrN Coatings Deposited by Mid-Frequency Magnetron Sputtering [J] . 容双全, 何俊, 王红军, 等离子体科学和技术：英文版 . 2009,第001期
• 3. New rotatabie magnetrons and target materials:Enabling higher performance sputter coatings [C] . Niek De Wilde, Jorg Oberste-Berghaus, Ivan Van de Putte Web Coating and Handling Conference . 2016
• 4. Sputter target erosion and its effects on long duration DC magnetron sputter coating [D] . Schoff, Michael Elliott 2009
• 5. RF magnetron-sputtered coatings deposited from biphasic calcium phosphate targets for biomedical implant applications [O] . K.A. Prosolov, K.S. Popova, O.A. Belyavskaya, 2017
• 6. MULTILAYER COATINGS Ti/TiN Cr/CrN AND W/WN DEPOSITED BY MAGNETRON SPUTTERING FOR IMPROVEMENT OF ADHESION TO BASE MATERIALS [O] . Horník Jakub, Krum Stanislav, Tondl David, 2017
• 7. Magnetron CO-Sputtering System for Coating ICF Targets. [R] . Hsieh, E. J., Meyer, S. F., Halsey, W. G., 1981

• 1. Applications of Cr-Based Metal Nitride Hard Coatings Using Multi-Magnetron Sputtering Sources and Elemental Metal Targets [J] . ShicaiYang ,EricWiemann ,D.C.Teer . 材料热处理学报 . 2004,第05B期
• 2. Synthesis and properties of Cr-Al-Si-N films deposited by hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and DC pulse sputtering [J] . Min Su KANG ,Tie-gang WANG ,Jung Ho SHIN . 中国有色金属学会会刊：英文版 . 2012,第S3期
• 3. Comparative Analysis of the Structural and Physical Properties of Magnetron Co-sputtered Silver Containing Hydroxyapatite Coatings and Si-doped hydroxyapatite on Titanium Substrates. [J] . Dorothy Araba Yakoba Agyapong12 ,Hongjuan Zeng1 ,Isaac Acquah2 . 纳米科技 . 2015,第005期
• 4. ZnO磁控溅射靶材及其在玻璃镀膜中的应用 [C] . 杨晔 ,兰品军 ,王木钦 . 2016年中国玻璃行业年会暨技术研讨会 . 2016
• 5. 磁控溅射镀膜用纯钽靶材微观组织控制及其应用 [A] . 袁倩靖 . 2018