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Plasma developable negative resist compositions for electron beam, X-ray and optical lithography
Plasma developable negative resist compositions for electron beam, X-ray and optical lithography
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机译:用于电子束,X射线和光刻的等离子显影负性抗蚀剂组合物
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摘要
A negative resist composition including a polymeric matrix material, a polymerizable monomer, and an onium salt radiation sensitive initiator. The monomer is polymerized by irradiating the resist with an e- beam, x- ray, or ultraviolet source and heating the exposed resist. The resist is developed by a dry etchant such as plasma or a reactive ion etchant.
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