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THIN FILM RESISTOR EXCELLENT IN TRANSMISSION OF LIGHT AND CORROSION RESISTANCE AND SPUTTERING METHOD FOR OBTAINING THIS THIN FILM RESISTOR
THIN FILM RESISTOR EXCELLENT IN TRANSMISSION OF LIGHT AND CORROSION RESISTANCE AND SPUTTERING METHOD FOR OBTAINING THIS THIN FILM RESISTOR
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机译:透光性和耐腐蚀性优异的薄膜电阻器以及采用该薄膜电阻器的溅射方法
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摘要
PURPOSE:To enhance light transmission and corrosion resistance, by constituting a thin film resistor of an amorphous film having the specified composition consisting of Cr, Si and Fe of specified thickness. CONSTITUTION:A thin film resistor consists of an amorphous film having composition of by weight 0.07-0.10% Cr, 66.5-72.2% Si and the balance Fe and the film thickness of this amorphous film is regulated to 200-2,000nm. In the above-mentioned composition, when Cr is less than 0.07%, corrosion resistance is reduced and when it is more than 0.10%, the transmission of visible rays of light is reduced. When Si is less than 66.5%, the adhesion of the film is reduced and when it is more than 72.2%, the transmission of visible rays of light is reduced. Further the thin film resistor is made to the amorphous film in order to enhance corrosion resistance and when the film thickness is less than 20nm, corrosion resistance is reduced and electric resistance value is made excessively large and when it is more than 2,000nm, the transmission of visible rays of light is reduced. Further the above-mentioned thin film resistor can be obtained by such a sputtering method generating discharge between a target consisting of 20-30% Cr, 10-20% Si and the balance Fe and material to be treated under reduced pressure.
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