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Protective triac without gate realized with the aid of a high-resistance substrate

机译:借助高阻衬底实现无栅极保护三端双向可控硅开关元件

摘要

1. Trigger-electrode protection triac with avalanche firing constituted by a semiconductor wafer incorporating two antiparallel-connected thyristors (TH1, TH2), each thyristor having an anode zone (AN1, AN2) of type P, a central zone (CE1, CE2) of type N, a trigger zone (GA1, GA2) of type P and a cathode zone (CA1, CA2) of type N, the central zones of type N of the two thyristors being formed by the same substrate layer of type N, a metallization (ME1, ME2) covering each face of the wafer, the anode zone and the cathode zone lying at said face, and short-circuiting holes (CC1, CC2) through which the trigger zone of type P extends through the cathode zone of type N up to the metallization covering the latter, characterized in that the central region comprises a weak concentration of type N so that the superficial inverse breakdown voltage at the level of the junction between the central zone and the trigger zone is higher than the trigger voltage of the triac and that for each thyristor (TS1, TS2) at least one specific zone (AS1, AS2) of type N is provided which is doped more than the central zone and separates the central zone from the trigger zone, said zone being arranged in alignment with a portion of the trigger zone of the corresponding thyristor but not extending through to the periphery of the semiconductor wafer.
机译:1.具有雪崩点火的触发电极保护双向可控硅,由半导体晶片组成,该半导体晶片包含两个反并联连接的晶闸管(TH1,TH2),每个晶闸管均具有P型阳极区(AN1,AN2),中央区(CE1,CE2) N型,N型的触发区(GA1,GA2)和N型的阴极区(CA1,CA2),两个晶闸管的N型中心区由相同的N型衬底层形成,覆盖晶片各面的金属化层(ME1,ME2),位于该面的​​阳极区和阴极区以及短路孔(CC1,CC2),P型触发区穿过这些短路孔延伸穿过Type阴极区N直到覆盖后者的金属化层,其特征在于,中心区域包含N型弱浓度,因此中心区域和触发区域之间的结点处的表面反向击穿电压高于N的触发电压。双向可控硅和每个晶闸管(TS1,TS2)提供至少一个类型为N的特定区域(AS1,AS2),其掺杂比中心区域更多,并且将中心区域与触发区域分开,所述区域与触发的一部分对准布置。相应晶闸管的区域,但不延伸到半导体晶片的外围。

著录项

  • 公开/公告号EP0167440B1

    专利类型

  • 公开/公告日1988-02-03

    原文格式PDF

  • 申请/专利权人 THOMSON SEMICONDUCTEURS;

    申请/专利号EP19850401223

  • 发明设计人 NOGUIER JEAN-PIERRE;MONTAUT JEAN-PAUL;

    申请日1985-06-19

  • 分类号H01L29/747;H01L29/10;

  • 国家 EP

  • 入库时间 2022-08-22 06:55:49

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