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PROCESS FOR PRODUCING A SINGLE CRYSTAL OF A GROUP III-V SEMICONDUCTOR COMPOUND BY THE LIQUID ENCAPSULATION CZOCHRALSKI DRAWING METHOD

机译:用液体包封直拉法绘制III-V族半导体化合物的单晶的方法

摘要

PROCESS FOR PRODUCING A MONOCRYSTAL OF A GROUP III-V SEMICONDUCTOR COMPOUND BY THE CZOCHRALSKI DRAWING METHOD BY LIQUID ENCAPSULATION COMPRISING A FIRST MEANS FOR OBTAINING THE REDUCTION OF THE RATE OF DISLOCATIONS IN THE BODY OF LINGOT, CONSISTING OF OF A SHRINKAGE OF THE DIAMETER OF THE LINGOT AT THE BEGINNING OF DRAWING OR THROAT, CHARACTERIZED IN THAT IT ALSO INCLUDES A SECOND MEANS CONSISTING OF FORMATION AT THE SOLID-LIQUID INTERFACE OF THE DRAWING OF A FLAT SIDE ACCORDING TO A PERPENDICULAR CRYSTALLOGRAPHIC FACET AT THE DRAWING AXIS, THE LAST BEING CHOOSED PRIOR TO ALLOWING THE EXISTENCE OF SUCH A FACET, AND THIS INTERFACE PLANE OF A DIAMETER SLIGHTLY LOWER THAN THE DIAMETER OF THE LINGOT, AND A THIRD MEANS CONSISTING OF THE INTRODUCTION IN THE BATH FOR DRAWING DOPING ELEMENTS SELECTED AMONG ELEMENTS INDUCING FOR THE INGOT A CONDUCTIVITY OF TYPE N, P OR SEMI-INSULATION, AND OF DIAMETER AND IN QUANTITY AS THEY PRODUCE A VARIATION OF THE DIMENSION OF THE CRYSTALLINE MESH OF THE SAME ORDER OF SIZE AS THE VARIATION CAUSED BY THERMAL GRADIENT BETWEEN THE ZONE OF THE FLAT SIDE AND THE OUTER EDGE OF THE LINGOT. /P P APPLICATION: PRODUCTION OF INDIUM PHOSPHIDE MONOCRYSTALS OF DIFFERENT TYPES OF CONDUCTIVITY AND LARGE DIAMETER WITHOUT DISLOCATIONS.
机译:用Czochralski拉丝法通过液相包封法生产包含III-V族半导体化合物的单晶的方法,该方法包括第一方法,用于减少舌形体中的错位率,包括SH屑舌片在拉丝或喉咙开始时的特征是,它还包括第二个手段,即根据垂直方向上的结晶晶状体在垂直方向上刻画的字形,在扁平侧面的固液界面上形成了固形界面允许存在这样的面,并且该界面的直径比舌尖的直径略低,并且在浴中引入了第三种方法,用于在元素的引入中选择在元素中引入的浸出元素N,P或半绝缘,直径和数量均会产生SA的结晶网尺寸的变化尺寸等级,是由平板侧面的区域和舌尖的外边缘之间的热梯度引起的变化。

应用:各种类型的电导率和大直径的磷化铟单晶的生产而没有错位。

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