首页> 外国专利> EDGE JUNCTION TYPE SINGLE CRYSTAL THIN FILM SUPERCONDUCTOR TUNNEL JUNCTION ELEMENT AND MANUFACTURE THEREOF

EDGE JUNCTION TYPE SINGLE CRYSTAL THIN FILM SUPERCONDUCTOR TUNNEL JUNCTION ELEMENT AND MANUFACTURE THEREOF

机译:边缘结型单晶薄膜超导体隧道结单元及其制造

摘要

PURPOSE:To form a tunnel junction making use of a superconductor single crystal thin film so as to take advantage of a magnetic and electric anisotropic property of the single crystal by a method wherein a first superconductor single crystal thin film, an interlaminar insulating film, and a second superconductor single crystal thin film which is provided so as to form a step and junctioned with the first superconductor single crystal thin film through the intermediary of a thin insulating film are provided. CONSTITUTION:A first superconductor thin film 2 of La-Sr-Cu-O or the like is formed on a SrTiO2 (100) face of a cubic crystal perovskite structure through a sputtering evaporation. Next, the face vertical to the substrate is made to be a c axis when the first thin film 2 is subjected to a heat treatment at a temperature of 800 deg.C or higher so as to be a single crystal, then a SiO2 film 3 is formed thereon as an interlaminar insulating film through a CVD method after the single crystallization of the film 2 is completed. A process follows, where the SiO2 film 3 and the second superconductor layer 2 are etched through a resist employed as a mask for the formation of a pattern. Next, impurity ions are slantingly implanted so as to convert the composition of the superconductor for the formation of a thin film 4. Lastly, a second superconductor layer (La-Sr-Cu-O) 5 is evaporated through a sputtering and subjected to a heat treatment so as to be converted into a single crystal.
机译:用途:利用超导体单晶薄膜形成隧道结,以便通过一种方法利用单晶的磁和电各向异性,其中第一超导体单晶薄膜,层间绝缘膜和提供第二超导单晶薄膜,该第二超导单晶薄膜设置成形成台阶并且通过薄绝缘膜与第一超导单晶薄膜接合。组成:La-Sr-Cu-O等的第一超导薄膜2通过溅射蒸发形成在立方晶钙钛矿结构的SrTiO2(100)面上。接下来,当在800℃以上的温度下对第一薄膜2进行热处理以使其成为单晶时,使垂直于基板的面为ac轴,从而形成SiO 2膜3。膜2的单晶化完成后,通过CVD法在其上形成层间绝缘膜。随后的过程是,通过用作掩模的抗蚀剂蚀刻SiO 2膜3和第二超导层2,以形成图案。接下来,倾斜地注入杂质离子,以转换用于形成薄膜4的超导体的组成。最后,通过溅射使第二超导体层(La-Sr-Cu-O)5蒸发并进行溅射。热处理以便转化为单晶。

著录项

  • 公开/公告号JPH01117376A

    专利类型

  • 公开/公告日1989-05-10

    原文格式PDF

  • 申请/专利权人 MITSUBISHI ELECTRIC CORP;

    申请/专利号JP19870179622

  • 发明设计人 INUISHI MASAHIDE;

    申请日1987-07-17

  • 分类号H01L39/24;H01L39/22;

  • 国家 JP

  • 入库时间 2022-08-22 06:45:30

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