CHEMICAL VAPOUR DEPOSITION METHOD TO PRODUCE AN ELECTRONIC DEVICE HAVING A MULTI-LAYER STRUCTURE

摘要

- 36 -ABSTRACT OF THE DISCLOSUREA method for producing an electronic devicehaving a multi-layer structure comprising one or moresemiconductor thin layers controlled in valence electronformed on a substrate comprises forming at least one ofsaid semiconductor thin layers controlled in valenceelectron according to the photo CVD method and formingat least one of other constituent layers according tothe method comprising introducing a gaseous startingmaterial for formation of a deposited film and a gaseoushalogenic oxidizing agent having the property ofoxidation action for said starting material into areaction space to effect chemical contact therebetweento thereby form a plural number of precursors containinga precursor in an excited state and transferring atleast one precursor of those precursors into a filmforming space communicated with the reaction space as afeeding source for the constituent element of thedeposited film.