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DISSIMILAR SUPERIMPOSED GRATING PRECISION ALIGNMENT AND GAP MEASUREMENT SYSTEMS

机译:相似的叠加式光栅精度校准和间隙测量系统

摘要

A substrate having a diffraction grating of a first periodicity formed thereon, a mask having a diffraction grating of a second periodicity formed thereon, the mask and substrate being positioned such that the respective mask and substrate gratings are generally parallel opposing one another on the mask and substrate, means for providing collimated coherent light directed so as to impinge on the mask and substrate gratings, and means for separately collecting, recombining, and detecting the intensity of at least a first given order of diffracted light beams as respectively diffracted by the mask and substrate gratings.
机译:具有在其上形成的第一周期性的衍射光栅的基板,在其上形成的具有第二周期性的衍射光栅的掩模,该掩模和衬底被定位成使得各自的掩模和衬底光栅在掩模上大致平行地彼此相对。衬底,用于提供定向的准直的相干光的装置,该准直的相干光被引导以撞击在掩模和衬底光栅上,以及用于分别收集,重组和检测分别由掩模和衬底分别衍射的至少第一给定阶数的衍射光束的强度的装置。基板光栅。

著录项

  • 公开/公告号DE3479352D1

    专利类型

  • 公开/公告日1989-09-14

    原文格式PDF

  • 申请/专利权人 HUGHES AIRCRAFT COMPANY;

    申请/专利号DE19843479352T

  • 发明设计人 BARTELT JOHN L.;

    申请日1984-09-26

  • 分类号G03B41/00;G01B11/27;

  • 国家 DE

  • 入库时间 2022-08-22 06:31:41

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