AQUEOUS ACID BATH FOR GALVANIC DEPOSITION OF GLOSSY AND LEVELED COPPER COATINGS

摘要

An aqueous acidic bath for the electrodeposition of bright and level copper coatings contains at least one benzothiazonium compound of the general formula IMAGE in which R1 is C1-C5-alkyl, optionally substituted aryl or aralkyl, R2 is hydrogen, C1-C5-alkyl or C1-C5-alkoxy, R3 and R4 are each C1-C5-alkyl and X is an acid radical.