METHOD FOR PLASMA-ACTIVATED REACTIVE DEPOSITION OF ELECTRICALLY CONDUCTIVE MULTI-COMPONENT MATERIAL FROM A GAS PHASE

摘要

Electrically conductive multicomponent material is deposited on a tubular substrate (3) by means of a PCVD method. A plasma (9) is produced between an inner electrode (13) and an outer electrode, one of which is tubular and serves as a substrate. In order to obtain multicomponent material of the desired composition, the composition of the gas phase is changed as a function of time and/or place. In particular when metalorganic starting compounds are used, PCVD of many single layers together with an intermittent, for example, Ar/O2 plasma intermediate treatment yields an efficient removal of undesired carbon or fluorine from the deposited multicomponent material already during its manufacture.